nanometer-scale patterning on pmma resist by force microscopy lithography
نویسندگان
چکیده
nanoscale science and technology has today mainly focused on the fabrication of nano devices. in this paper, we study the use of lithography process to build the desired nanostructures directly. nanolithography on polymethylmethacrylate (pmma) surface is carried out by using atomic force microscope (afm) equipped with silicon tip, in contact mode. the analysis of the results shows that the depth of scratches increases with the increase of applied normal force. the scanning velocity is also shown to influence the afm patterning process. as the scanning velocity increases, the scratch depth decreases. the influence of time and number of scratching cycles is also investigated.
منابع مشابه
Nanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography
Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...
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عنوان ژورنال:
iranian journal of chemistry and chemical engineering (ijcce)ناشر: iranian institute of research and development in chemical industries (irdci)-acecr
ISSN 1021-9986
دوره 27
شماره 4 2008
میزبانی شده توسط پلتفرم ابری doprax.com
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